ACID PAINT REMOVER

Disclosed is an aqueous acidic developing solution for a photoresist comprising an acid having from about 1 to 8 carbon atoms, in an effective combination with a solubilizing solvent for the photoresist.

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Bibliographische Detailangaben
Hauptverfasser:	CHARLES, HARRY R
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is an aqueous acidic developing solution for a photoresist comprising an acid having from about 1 to 8 carbon atoms, in an effective combination with a solubilizing solvent for the photoresist.