CVD system having particle separator

The invention relates to a device for coating substrates in a process chamber (8) of a reactor housing (1), having a gas inlet member (11) for introducing process gases into the process chamber (8), having a gas outlet member (10) for discharging an exhaust gas stream from the process chamber (8) in...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Lehnen, Peer, Mallmann, Heinrich, Goeres, Wilfried
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ENGINE PLANTS IN GENERAL GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MACHINES OR ENGINES IN GENERAL MECHANICAL ENGINEERING METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION STEAM ENGINES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	The invention relates to a device for coating substrates in a process chamber (8) of a reactor housing (1), having a gas inlet member (11) for introducing process gases into the process chamber (8), having a gas outlet member (10) for discharging an exhaust gas stream from the process chamber (8) into a particle filter (4), which is disposed in a particle separator housing (3) and has a porous filter medium (16) for out-filtering particles from the exhaust gas stream, which form during a reaction of the process gases. In order to improve the filtering performance of a particle filter at a CVD or PVD device and to specify a suitable particle filter for this intended purpose, the invention suggests that the pore size and the surface quality of the filter medium (16) are selected in such a manner that the particles located in the exhaust gas stream adhere to the surface of the filter medium (16), however do not penetrate the filter medium (16), and the particles grow to conglomerates outside of the filter medium (16), and a mass acceleration device is provided for cleaning the particle filter (4) by mechanically removing the conglomerates.