Systems and methods for bulk vaporization of precursor

A vaporization system for liquid precursor includes a bubbler portion configured to store liquid precursor and to supply carrier gas into the liquid precursor to vaporize the liquid precursor to generate vaporized precursor. A baffle portion is arranged in fluid communication with the bubbler portio...

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Bibliographische Detailangaben
1. Verfasser:	Lind, Gary
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEATGENERATING MEANS, IN GENERAL HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY RANGES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION VENTILATING WEAPONS
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Beschreibung
Zusammenfassung:	A vaporization system for liquid precursor includes a bubbler portion configured to store liquid precursor and to supply carrier gas into the liquid precursor to vaporize the liquid precursor to generate vaporized precursor. A baffle portion is arranged in fluid communication with the bubbler portion and includes N heated baffles, where N is an integer greater than or equal to one. The vaporized precursor generated by the bubbler portion passes through the N heated baffles before flowing to a substrate processing system.