Method for manufacturing heat exchanger, and heat exchanger

A method for manufacturing a heat exchanger includes: assembling a plurality of heat exchanger components in an assembly step; and forming a film on surfaces of the heat exchanger components using a chemical vapor deposition method in a film formation step after the assembly step. The film can restr...

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Bibliographische Detailangaben
Hauptverfasser:	Kafuku, Kazuaki, Tera, Ryonosuke, Kuroyanagi, Isao, Yamanaka, Yasutoshi, Sano, Yukihiro
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMBINED OPERATIONS DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION DIFFUSION TREATMENT OF METALLIC MATERIAL HEAT EXCHANGE IN GENERAL HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS,IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MACHINE TOOLS MECHANICAL ENGINEERING METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY OTHER WORKING OF METAL PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING UNIVERSAL MACHINE TOOLS WEAPONS
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Beschreibung
Zusammenfassung:	A method for manufacturing a heat exchanger includes: assembling a plurality of heat exchanger components in an assembly step; and forming a film on surfaces of the heat exchanger components using a chemical vapor deposition method in a film formation step after the assembly step. The film can restrict a formation of a through hole due to corrosion. The film can be restricted from being damaged at a delivery or assembling time, because the film formation step is provided after the assembly step. An occurrence of clogging can be restricted at a minute portion inside of the heat exchanger in the film formation step, because the film is formed using the chemical vapor deposition method.