Inspection method and apparatus, and lithographic apparatus

A method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method includes measuring an error in the image characteristic of the substrate, and determining a c...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Deckers David, Rhe Kyu Kab, Theeuwes Thomas, Simons Hubertus Johannes Gertrudus
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method includes measuring an error in the image characteristic of the substrate, and determining a correction for a subsequent formation of the product features based upon the measured error and a characteristic of one or more of the product feature(s).