Stage apparatus, lithographic apparatus and method of positioning an object table
A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor...
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| creator | Van Der Pasch Engelbertus Antonius Fransiscus Jeunink Andre Bernardus Eussen Emiel Jozef Melanie Van Leeuwen Robbert Edgar |
| description | A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9915880B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9915880B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9915880B23</originalsourceid><addsrcrecordid>eNqNirsKwkAQAK-xEPUf9gMUfCAkbUSxlWgdNpfNZeW8XXLr_5tCsLUamJm5u9WGgQBVcUR75zVEtkHCiDqw_3nA1MGLptSB9KCS2VgSpzAVkPZJ3sCwjbR0sx5jptWXCweX8_103ZBKQ1nRUyJrHnVZ7o5Fsa32hz-WD4UbN6Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Stage apparatus, lithographic apparatus and method of positioning an object table</title><source>esp@cenet</source><creator>Van Der Pasch Engelbertus Antonius Fransiscus ; Jeunink Andre Bernardus ; Eussen Emiel Jozef Melanie ; Van Leeuwen Robbert Edgar</creator><creatorcontrib>Van Der Pasch Engelbertus Antonius Fransiscus ; Jeunink Andre Bernardus ; Eussen Emiel Jozef Melanie ; Van Leeuwen Robbert Edgar</creatorcontrib><description>A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180313&DB=EPODOC&CC=US&NR=9915880B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180313&DB=EPODOC&CC=US&NR=9915880B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Van Der Pasch Engelbertus Antonius Fransiscus</creatorcontrib><creatorcontrib>Jeunink Andre Bernardus</creatorcontrib><creatorcontrib>Eussen Emiel Jozef Melanie</creatorcontrib><creatorcontrib>Van Leeuwen Robbert Edgar</creatorcontrib><title>Stage apparatus, lithographic apparatus and method of positioning an object table</title><description>A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNirsKwkAQAK-xEPUf9gMUfCAkbUSxlWgdNpfNZeW8XXLr_5tCsLUamJm5u9WGgQBVcUR75zVEtkHCiDqw_3nA1MGLptSB9KCS2VgSpzAVkPZJ3sCwjbR0sx5jptWXCweX8_103ZBKQ1nRUyJrHnVZ7o5Fsa32hz-WD4UbN6Q</recordid><startdate>20180313</startdate><enddate>20180313</enddate><creator>Van Der Pasch Engelbertus Antonius Fransiscus</creator><creator>Jeunink Andre Bernardus</creator><creator>Eussen Emiel Jozef Melanie</creator><creator>Van Leeuwen Robbert Edgar</creator><scope>EVB</scope></search><sort><creationdate>20180313</creationdate><title>Stage apparatus, lithographic apparatus and method of positioning an object table</title><author>Van Der Pasch Engelbertus Antonius Fransiscus ; Jeunink Andre Bernardus ; Eussen Emiel Jozef Melanie ; Van Leeuwen Robbert Edgar</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9915880B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Van Der Pasch Engelbertus Antonius Fransiscus</creatorcontrib><creatorcontrib>Jeunink Andre Bernardus</creatorcontrib><creatorcontrib>Eussen Emiel Jozef Melanie</creatorcontrib><creatorcontrib>Van Leeuwen Robbert Edgar</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Van Der Pasch Engelbertus Antonius Fransiscus</au><au>Jeunink Andre Bernardus</au><au>Eussen Emiel Jozef Melanie</au><au>Van Leeuwen Robbert Edgar</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Stage apparatus, lithographic apparatus and method of positioning an object table</title><date>2018-03-13</date><risdate>2018</risdate><abstract>A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Stage apparatus, lithographic apparatus and method of positioning an object table |
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