Method for producing mold for nanoimprinting and anti-reflective article

This method for producing a mold for nanoimprinting in which a minute bumpy structure has been formed at the surface of a roller-shaped aluminum substrate of which the surface has been machined has: a polishing step for mechanically polishing the surface of the roller-shaped aluminum substrate, of w...

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Bibliographische Detailangaben
Hauptverfasser: Takanashi Kazuya, Hara Katsumi, Shakagoori Shinya, Onomoto Hiroshi, Ookawa Makoto
Format: Patent
Sprache:eng
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Zusammenfassung:This method for producing a mold for nanoimprinting in which a minute bumpy structure has been formed at the surface of a roller-shaped aluminum substrate of which the surface has been machined has: a polishing step for mechanically polishing the surface of the roller-shaped aluminum substrate, of which the surface has been machined, at least until the average crystal grain size changes; and a minute bumpy structure formation step for anodizing the aluminum substrate after the polishing step and forming a minute bumpy structure. The anti-reflective article has a minute bumpy structure at the surface, and in the wavelength region of visible light, has a color difference (E*) to the origin represented in the L*a*b* color system and derived by means of formula (1) of no greater than 0.9, or a chroma (C*) determined by means of formula (2) of no greater than 0.7. E*={(L*)2+(a*)2+(b*)2}1/2  (1) C*={(a*)2+(b*)2}1/2  (2)