Method for eliminating mask self-magnetization, substrate manufacturing method and mask testing device

Disclosed are a method for eliminating self-magnetization of a mask, a method for manufacturing a substrate and a mask testing device. The mask may include a plurality of metal stripes spaced from each other. The method may include a step of: energizing the mask, so as to enable the plurality of met...

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Bibliographische Detailangaben
Hauptverfasser:	Zhang Guoping, Wu Yongkai, Li Junyu, Wu Yan, Feng Jianbin, Shang Yuedong, Zhang Bo
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Disclosed are a method for eliminating self-magnetization of a mask, a method for manufacturing a substrate and a mask testing device. The mask may include a plurality of metal stripes spaced from each other. The method may include a step of: energizing the mask, so as to enable the plurality of metal stripes to carry like charges, thereby separating every metal stripe from other adjacent metal stripes bonded together.