Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same

The present invention relates to a novel β-oximester fluorene derivative compound, a photopolymerization initiator comprising the same, and a photoresist composition.

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Bibliographische Detailangaben
Hauptverfasser:	Shin Seung-Rim, Oh Chun-Rim, Lee Sang-Oh, Lee Min-Sun, Cho Yong-Il, Lee Won-Jung, Shin Jong-Il, Jun Kun
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a novel β-oximester fluorene derivative compound, a photopolymerization initiator comprising the same, and a photoresist composition.