Conductive pattern fabrication method

A method of producing a conductive pattern includes a light-exposing step of exposing a layer or pattern including conductive particles A, an organic compound B having an unsaturated double bond and a photopolymerization initiator C, and positioned over a substrate to light rays having a broad spect...

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Bibliographische Detailangaben
Hauptverfasser: Tanabe Miharu, Kusano Kazutaka, Iguchi Yuichiro
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of producing a conductive pattern includes a light-exposing step of exposing a layer or pattern including conductive particles A, an organic compound B having an unsaturated double bond and a photopolymerization initiator C, and positioned over a substrate to light rays having a broad spectrum, to thereby produce a conductive layer or a conductive pattern.