Apparatus and method for a diamond substrate for a multi-layered dielectric diffraction grating
The present invention provides a method and apparatus for fabricating a grating on a silicon substrate, and the resulting grating device. In some embodiments, the apparatus method includes providing a silicon substrate; growing a diamond layer on the substrate; removing most of the silicon substrate...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The present invention provides a method and apparatus for fabricating a grating on a silicon substrate, and the resulting grating device. In some embodiments, the apparatus method includes providing a silicon substrate; growing a diamond layer on the substrate; removing most of the silicon substrate and polishing an obverse face of the silicon to leave a very thin layer of polished silicon on the diamond layer; depositing a stack on the diamond layer, wherein the stack includes a plurality of pairs of dielectric layers on the thin layer of polished silicon, wherein each pair of the plurality of pairs of dielectric layers includes a first layer having a first index of refraction value and a second layer having a second index of refraction value that is different than the first index of refraction value; and forming a diffraction grating on an outer surface of the stack. |
---|