Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing method

A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more c...

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Bibliographische Detailangaben
Hauptverfasser: Psara Eleni, Van Setten Eelco, Davydova Natalia Viktorovna, Van Oosten Anton Bernhard
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more characteristics of the mask. The method can be used to model shadowing effects of a EUV mask with a thick absorber illuminated at an angle.