Water treatment valve control system with rotary position sensor

Water treatment and valve control systems and apparatuses, and methods of using the same, are disclosed. In some examples, the apparatuses, systems, and methods include use of a rotary position sensor and one or more rotatable elements configured to, when moving from an initial rotational position t...

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Bibliographische Detailangaben
Hauptverfasser:	Downs James J, Kajpust Andrew J, Sielaff Daryl D
Format:	Patent
Sprache:	eng
Schlagworte:	ACTUATING-FLOATS BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COCKS DEVICES FOR VENTING OR AERATING ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL TAPS THEIR RELEVANT APPARATUS THERMAL INSULATION IN GENERAL TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE VALVES WEAPONS
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Beschreibung
Zusammenfassung:	Water treatment and valve control systems and apparatuses, and methods of using the same, are disclosed. In some examples, the apparatuses, systems, and methods include use of a rotary position sensor and one or more rotatable elements configured to, when moving from an initial rotational position to subsequent rotational positions, move one or more element of a valve assembly. In various examples of the apparatuses, systems, and methods, the rotatable element rotates directly from one rotational position to another rotational position. In certain examples, the rotary position sensor measures an electrical resistance value to detect the rotational position of the rotatable element.