Method of inspecting a surface of a substrate and apparatus for performing the same

In a method of inspecting a surface of a substrate, a first surface image of the substrate before loaded into a process chamber may be obtained. The first surface image may be processed to detect a defect on the surface of the substrate. Thus, the surfaces of all of the substrate may be inspected du...

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Bibliographische Detailangaben
Hauptverfasser:	Kim Myung-Woo, Kim Kyoung-Hwan, Lee Eun-Seok, Koo Bon-Ok, Hong Jin-Suk, Kim Hyun-Chul, Kim In-Gi, Min Gyung-Jin, Roh Sung-Ki, Kang Byung-Bok, Kang Seok-Min
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	In a method of inspecting a surface of a substrate, a first surface image of the substrate before loaded into a process chamber may be obtained. The first surface image may be processed to detect a defect on the surface of the substrate. Thus, the surfaces of all of the substrate may be inspected during a process may be performed without transferring the substrates.