Method of manufacturing chemical mechanical polishing pads

A method of manufacturing chemical mechanical polishing pads is provided, wherein an automated inspection system is configured to detect macro inhomogeneities is skived sheets and to classify the skived sheets as either acceptable or suspect; wherein the acceptable skived sheets are further processe...

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Bibliographische Detailangaben
Hauptverfasser: Chiang Leo H, Gazze Mark, Heeschen William A, Wank Andrew, Chang Scott, Acholla Francis V, Tsai Jeff, Chin Swee-Teng, Tate James David
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of manufacturing chemical mechanical polishing pads is provided, wherein an automated inspection system is configured to detect macro inhomogeneities is skived sheets and to classify the skived sheets as either acceptable or suspect; wherein the acceptable skived sheets are further processed to form polishing layers of chemical mechanical polishing pads.