Illumination optical unit for projection lithography

The disclosure provides an illumination optical unit for projection lithography, which illuminates an object field with illumination light. The illumination optical unit includes a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The fiel...

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Bibliographische Detailangaben
1. Verfasser:	Maul Manfred
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The disclosure provides an illumination optical unit for projection lithography, which illuminates an object field with illumination light. The illumination optical unit includes a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The field facets are imaged in the object field by a transfer optical unit. The pupil facet mirror includes a pupil facet mirror polarization section and a pupil facet mirror neutral section. The polarization section is arranged so that the illumination light is reflected in the region of a Brewster angle. The neutral section is arranged so that the illumination light is reflected in the region of a normal incidence.