Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of...

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Hauptverfasser: Tinnemans Patricius Aloysius Jacobus, De Graaf Roelof Frederik, Hoogendam Christiaan Alexander, Teunissen Franciscus Johannes Herman Maria, Verhagen Martinus Cornelis Maria, Mertens Jeroen Johannes Sophia Maria, Van Der Net Antonius Johannus, Donders Sjoerd Nicolaas Lambertus, Verspay Jacobus Johannus Leonardus Hendricus, Van Gompel Edwin Augustinus Matheus
Format: Patent
Sprache:eng
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Zusammenfassung:A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.