Lithographic apparatus and to a reflector apparatus

Disclosed is a reflector apparatus comprising a reflector and an array of thermoelectric heat pumps each having a first end proximal to and in thermal contact with the reflector and having a second end distal from the reflector, a lithography tool having such a reflector apparatus, and a method of u...

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Bibliographische Detailangaben
1. Verfasser:	Osuman Andani Alhassan
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY COMBINED HEATING AND REFRIGERATION SYSTEMS ELECTRICITY ELECTROGRAPHY HEAT PUMP SYSTEMS HEATING HOLOGRAPHY LIGHTING LIQUEFACTION SOLIDIFICATION OF GASES MANUFACTURE OR STORAGE OF ICE MATERIALS THEREFOR MECHANICAL ENGINEERING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REFRIGERATION MACHINES, PLANTS OR SYSTEMS REFRIGERATION OR COOLING WEAPONS
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Beschreibung
Zusammenfassung:	Disclosed is a reflector apparatus comprising a reflector and an array of thermoelectric heat pumps each having a first end proximal to and in thermal contact with the reflector and having a second end distal from the reflector, a lithography tool having such a reflector apparatus, and a method of using the same.