Semiconductor device with false drain

An electronic apparatus includes a semiconductor substrate and first and second transistors disposed in the semiconductor substrate. The first transistor includes a channel region and a drain region adjacent the channel region. The second transistor includes a channel region, a false drain region ad...

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Hauptverfasser: Parris Patrice M, Chen Weize
Format: Patent
Sprache:eng
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Zusammenfassung:An electronic apparatus includes a semiconductor substrate and first and second transistors disposed in the semiconductor substrate. The first transistor includes a channel region and a drain region adjacent the channel region. The second transistor includes a channel region, a false drain region adjacent the channel region, and a drain region electrically coupled to the channel region by a drift region such that the second transistor is configured for operation at a higher voltage level than the first transistor. The respective channel regions of the first and second transistors have a common configuration characteristic.