Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the subs...

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Bibliographische Detailangaben
Hauptverfasser: Van De Kerkhof Marcus Adrianus, Beckers Marcel, Bruijstens Jeroen Peter Johannes, Janssen Franciscus Johannes Joseph, Thomas Ivo Adam Johannes, Landheer Siebe
Format: Patent
Sprache:eng
Schlagworte:
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Zusammenfassung:A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.