Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a me...

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Bibliographische Detailangaben
Hauptverfasser: Meester Arnout Johannes, Miranda Marcio Alexandre Cano, Tanasa Gheorghe, Thomas Ivo Adam Johannes, Landheer Siebe
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.