Method of forming key patterns and method of fabricating a semiconductor device using the same

Method of forming key patterns and method of fabricating a semiconductor device using the same

Provided are a method of forming key patterns and a method of fabricating a semiconductor device using the same. The method of forming key patterns may include forming gate and key patterns on a cell region and a scribe lane region, respectively. Here, the key patterns may be formed to have a large...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Shin Heeju, Baek Jonghwa, Lee Hyunchang, Bae Yongkug, Jung Rankyung, Ham Boo-Hyun, Koo Ja-Min
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Provided are a method of forming key patterns and a method of fabricating a semiconductor device using the same. The method of forming key patterns may include forming gate and key patterns on a cell region and a scribe lane region, respectively. Here, the key patterns may be formed to have a large width and a larger pitch than those of the gate patterns.