Method of and apparatus for supply and recovery of target material

An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for sele...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Baumgart Peter, Gacutan Jeffrey, Algots Martin, Seshagiri Sanjeev, Vaschenko Georgiy, Syrpis Theodosios, Rajyaguru Chirag
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MEASURING MEASURING QUANTITY OF HEAT MEASURING TEMPERATURE PHOTOGRAPHY PHYSICS TESTING THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.