Nano deposition and ablation for the repair and fabrication of integrated circuits

An apparatus for and methods of repairing and manufacturing integrated circuits using the apparatus. The apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate; an inspection and analysis probe; a heat source; a gas injector; and a gas manifold connecting...

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Bibliographische Detailangaben
Hauptverfasser: Joseph Eric A, Adderly Shawn A, Speranza Anthony C, Gambino Jeffrey P
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus for and methods of repairing and manufacturing integrated circuits using the apparatus. The apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate; an inspection and analysis probe; a heat source; a gas injector; and a gas manifold connecting multiple gas sources to the gas injector.