Salt, acid generator, photoresist composition, and method for producing photoresist pattern

A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing gr...

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Bibliographische Detailangaben
Hauptverfasser:	Ichikawa Koji, Sakamoto Hiromu
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R2 represents an acid-labile group; and "m" represents an integer of 0 to 3.