Substrate transport roller

Provided is a substrate transport roller (2a) capable of ensuring a broad temperature-control region on a substrate, without reducing substrate transport quality. This substrate transport roller (2a) is provided in a film-forming device (1) for executing a film-forming process on the surface of a fi...

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Bibliographische Detailangaben
Hauptverfasser:	Tamagaki Hiroshi, Ohba Naoki
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY METHODS OF PRODUCING PAPER THEREON PAPER-MAKING PAPER-MAKING MACHINES PERFORMING OPERATIONS PRODUCTION OF CELLULOSE SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TEXTILES TRANSPORTING
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Beschreibung
Zusammenfassung:	Provided is a substrate transport roller (2a) capable of ensuring a broad temperature-control region on a substrate, without reducing substrate transport quality. This substrate transport roller (2a) is provided in a film-forming device (1) for executing a film-forming process on the surface of a film substrate (W), transports the film substrate (W) by rotating around a center axis, and is equipped with: a center-section segment (13a) positioned in the center section in the axial direction extending along the center axis, and having a first outer-circumferential surface; end-section segments (12a, 12b) positioned on both sides on the outside in the axial direction of the center-section segment (13a), and each having a second outer-circumferential surface which contacts the substrate (W) and has a larger diameter than that of the first outer-circumferential surface; a center-section-rising-falling-temperature-medium mechanism for changing the temperature of the center-section segment (13a); and a both-end-section-rising-falling-temperature mechanism for changing the temperature of each of the end-section segments (12a, 12b) independently from the center-section segment (13a).