Lamp for rapid thermal processing chamber

A lamp assembly for the lamp assembly adapted for use in a substrate thermal processing chamber to heat the substrate to temperatures up to at least about 1100° C. is disclosed. In one embodiment, the lamp assembly comprises a bulb enclosing at least one radiation generating filament attached to a p...

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Bibliographische Detailangaben
Hauptverfasser:	Sorabji Khurshed, Ranish Joseph M
Format:	Patent
Sprache:	eng
Schlagworte:	BAKERS' OVENS BAKING BASIC ELECTRIC ELEMENTS EDIBLE DOUGHS ELECTRIC INCANDESCENT LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HAIRDRESSING OR SHAVING EQUIPMENT HAND OR TRAVELLING ARTICLES HUMAN NECESSITIES MACHINES OR EQUIPMENT FOR BAKING MANICURING OR OTHER COSMETIC TREATMENT SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lamp assembly for the lamp assembly adapted for use in a substrate thermal processing chamber to heat the substrate to temperatures up to at least about 1100° C. is disclosed. In one embodiment, the lamp assembly comprises a bulb enclosing at least one radiation generating filament attached to a pair of leads, the bulb having an inner surface and an outer surface, a lamp base configured to receive the pair of leads and at least a portion of the bulb having a surface treatment adapted to reflect light away from the lamp base. In another embodiment, a sleeve covers the lamp base, which has a cross-sectional area less than about 1.2 times the cross-sectional area of the bulb.