Semiconductor devices and methods of fabricating the same

Semiconductor devices are provided. A semiconductor device includes gaps between conductive patterns. Moreover, the semiconductor device includes a permeable layer on the conductive patterns. Methods of fabricating semiconductor devices are also provided.

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Bibliographische Detailangaben
Hauptverfasser: Rha Sangho, You Wookyung, Lee Naein, Ahn Sanghoon, Baek Jongmin
Format: Patent
Sprache:eng
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Zusammenfassung:Semiconductor devices are provided. A semiconductor device includes gaps between conductive patterns. Moreover, the semiconductor device includes a permeable layer on the conductive patterns. Methods of fabricating semiconductor devices are also provided.