Inactive gas introducing facility and inactive gas introducing method

An inactive gas introducing facility includes an introducing device disposed in a support portion supporting a container accommodating a substrate and configured for introducing inactive gas to the inside of the container through a gas feed opening of the container with discharging gas present insid...

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Bibliographische Detailangaben
Hauptverfasser:	Takahara Masahiro, Ueda Toshihito
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HANDLING THIN OR FILAMENTARY MATERIAL MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGINGARTICLES OR MATERIALS PACKING PERFORMING OPERATIONS SEMICONDUCTOR DEVICES STORING TRANSPORTING UNPACKING
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Beschreibung
Zusammenfassung:	An inactive gas introducing facility includes an introducing device disposed in a support portion supporting a container accommodating a substrate and configured for introducing inactive gas to the inside of the container through a gas feed opening of the container with discharging gas present inside the container to the outside through a gas discharge opening of the container and a controller for controlling operation of the introducing device. The introducing device is capable of varying the feed rate of the inactive gas. The controller is configured to control the operation of the introducing device such that in the feeding of the inactive gas to the container supported to the support portion, the feed rate is increased progressively to a target feed rate.