Substrate holding apparatus and method

Provided are a substrate holding apparatus and a method of using the substrate holding apparatus. According to an aspect of the present invention, there is provided a substrate holding apparatus comprising a stage on which a substrate is placed, and at least one lift bar which separates the substrat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	Yoo Sung Hune
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Provided are a substrate holding apparatus and a method of using the substrate holding apparatus. According to an aspect of the present invention, there is provided a substrate holding apparatus comprising a stage on which a substrate is placed, and at least one lift bar which separates the substrate from the stage by raising the substrate or placing the substrate on the stage by lowering the substrate. The lift bar comprises a body and a head. The head is connected to an end of the body, contacts the substrate, and is formed of a porous material.