Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Partlo William N, Fleurov Vladimir B, Ershov Alexander I, Fomenkov Igor V
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	Partlo William N Fleurov Vladimir B Ershov Alexander I Fomenkov Igor V
description	An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9516730B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9516730B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9516730B23</originalsourceid><addsrcrecordid>eNqNikEKwjAQAHPxIOof9gOCWlR6VRTv1aOUbbJpA2k2ZFNEX28OPsDTMMPM1bN5S6ZRAIOBkfLARsBygm6ylhL0WNTzCyRj57z7YHYcwAVA8CjliInNpMlALD6W6vohg_CUNC3VzKIXWv24UHC93M-3NUVuSSJqCpTbR1Pvt4djtTntqj-WL3y2O_A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Systems and methods for buffer gas flow stabilization in a laser produced plasma light source</title><source>esp@cenet</source><creator>Partlo William N ; Fleurov Vladimir B ; Ershov Alexander I ; Fomenkov Igor V</creator><creatorcontrib>Partlo William N ; Fleurov Vladimir B ; Ershov Alexander I ; Fomenkov Igor V</creatorcontrib><description>An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.</description><language>eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GAMMA RAY OR X-RAY MICROSCOPES ; IRRADIATION DEVICES ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; PHYSICS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR ; X-RAY TECHNIQUE</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161206&DB=EPODOC&CC=US&NR=9516730B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161206&DB=EPODOC&CC=US&NR=9516730B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Partlo William N</creatorcontrib><creatorcontrib>Fleurov Vladimir B</creatorcontrib><creatorcontrib>Ershov Alexander I</creatorcontrib><creatorcontrib>Fomenkov Igor V</creatorcontrib><title>Systems and methods for buffer gas flow stabilization in a laser produced plasma light source</title><description>An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>IRRADIATION DEVICES</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>PHYSICS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNikEKwjAQAHPxIOof9gOCWlR6VRTv1aOUbbJpA2k2ZFNEX28OPsDTMMPM1bN5S6ZRAIOBkfLARsBygm6ylhL0WNTzCyRj57z7YHYcwAVA8CjliInNpMlALD6W6vohg_CUNC3VzKIXWv24UHC93M-3NUVuSSJqCpTbR1Pvt4djtTntqj-WL3y2O_A</recordid><startdate>20161206</startdate><enddate>20161206</enddate><creator>Partlo William N</creator><creator>Fleurov Vladimir B</creator><creator>Ershov Alexander I</creator><creator>Fomenkov Igor V</creator><scope>EVB</scope></search><sort><creationdate>20161206</creationdate><title>Systems and methods for buffer gas flow stabilization in a laser produced plasma light source</title><author>Partlo William N ; Fleurov Vladimir B ; Ershov Alexander I ; Fomenkov Igor V</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9516730B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>IRRADIATION DEVICES</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>PHYSICS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>Partlo William N</creatorcontrib><creatorcontrib>Fleurov Vladimir B</creatorcontrib><creatorcontrib>Ershov Alexander I</creatorcontrib><creatorcontrib>Fomenkov Igor V</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Partlo William N</au><au>Fleurov Vladimir B</au><au>Ershov Alexander I</au><au>Fomenkov Igor V</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Systems and methods for buffer gas flow stabilization in a laser produced plasma light source</title><date>2016-12-06</date><risdate>2016</risdate><abstract>An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng
recordid	cdi_epo_espacenet_US9516730B2
source	esp@cenet
subjects	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
title	Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T08%3A42%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Partlo%20William%20N&rft.date=2016-12-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9516730B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true