Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Partlo William N, Fleurov Vladimir B, Ershov Alexander I, Fomenkov Igor V
Format: Patent
Sprache:eng
Schlagworte:
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.