Fumaric acid diester-cinnamic acid ester-based copolymer, production method thereof and film using the same

To provide a novel fumaric acid diester-cinnamic acid ester-based copolymer having a high molecular weight, which is expected to maintain excellent strength or ensures excellent toughness even when formed into a film, a method for efficiently producing the copolymer, and a film using the same. The f...

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Hauptverfasser:	Doi Tohru, Fujii Yasuyoshi, Kitagawa Takahiro, Sakaguchi Kota, Inui Akira, Ito Masayasu
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES FILLING PASTES GENERAL PROCESSES OF COMPOUNDING INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS WORKING-UP
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Beschreibung
Zusammenfassung:	To provide a novel fumaric acid diester-cinnamic acid ester-based copolymer having a high molecular weight, which is expected to maintain excellent strength or ensures excellent toughness even when formed into a film, a method for efficiently producing the copolymer, and a film using the same. The fumaric acid diester-cinnamic acid ester-based copolymer contains a fumaric acid diester residue unit, a cinnamic acid ester residue unit having an alkyl group with a carbon number of 1 to 6, and a residue unit of a polyfunctional monomer having two or more radical polymerizable functional groups.