Lithographic apparatus and device manufacturing method

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometr...

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Bibliographische Detailangaben
Hauptverfasser:	Hennus Pieter Renaat Maria, Tinnemans Patricius Aloysius Jacobus, Fischer Olof Martinus Josephus, Hoeks Martinus Hendricus Henricus, Bosch Niels Johannes Maria, Slaghekke Bernardus Antonius, Van Der Wijst Marc Wilhelmus Maria, Van Der Schoot Harmen Klaas, Cadee Theodorus Petrus Maria, Aangenent Wilhelmus Henricus Theodorus Maria, Bleeker Arno Jan, Hol Sven Antoin Johan, Zaal Koen Jacobus Johannes Maria, Beerens Ruud Antonius Catharina Maria, Butler Hans
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DYNAMO-ELECTRIC MACHINES ELECTRICITY ELECTROGRAPHY GENERATION HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.