Lithographic apparatus and device manufacturing method
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Belfroid Stefan Philip Christiaan Ten Kate Nicolaas Verhagen Martinus Cornelis Maria Smeulers Johannes Petrus Maria Van Der Toorn Jan-Gerard Cornelis De Graaf Roelof Frederik Hoogendam Christiaan Alexander Teunissen Franciscus Johannes Herman Maria Vogel Herman Van Der Meulen Frits Mertens Jeroen Johannes Sophia Maria Kemper Nicolaas Rudolf Donders Sjoerd Nicolaas Lambertus Cox Henrikus Herman Marie |
| description | A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9488923B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9488923B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9488923B23</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwZYmFhaWRsZORsZEKAEAhE0t7A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>esp@cenet</source><creator>Belfroid Stefan Philip Christiaan ; Ten Kate Nicolaas ; Verhagen Martinus Cornelis Maria ; Smeulers Johannes Petrus Maria ; Van Der Toorn Jan-Gerard Cornelis ; De Graaf Roelof Frederik ; Hoogendam Christiaan Alexander ; Teunissen Franciscus Johannes Herman Maria ; Vogel Herman ; Van Der Meulen Frits ; Mertens Jeroen Johannes Sophia Maria ; Kemper Nicolaas Rudolf ; Donders Sjoerd Nicolaas Lambertus ; Cox Henrikus Herman Marie</creator><creatorcontrib>Belfroid Stefan Philip Christiaan ; Ten Kate Nicolaas ; Verhagen Martinus Cornelis Maria ; Smeulers Johannes Petrus Maria ; Van Der Toorn Jan-Gerard Cornelis ; De Graaf Roelof Frederik ; Hoogendam Christiaan Alexander ; Teunissen Franciscus Johannes Herman Maria ; Vogel Herman ; Van Der Meulen Frits ; Mertens Jeroen Johannes Sophia Maria ; Kemper Nicolaas Rudolf ; Donders Sjoerd Nicolaas Lambertus ; Cox Henrikus Herman Marie</creatorcontrib><description>A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161108&DB=EPODOC&CC=US&NR=9488923B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161108&DB=EPODOC&CC=US&NR=9488923B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Belfroid Stefan Philip Christiaan</creatorcontrib><creatorcontrib>Ten Kate Nicolaas</creatorcontrib><creatorcontrib>Verhagen Martinus Cornelis Maria</creatorcontrib><creatorcontrib>Smeulers Johannes Petrus Maria</creatorcontrib><creatorcontrib>Van Der Toorn Jan-Gerard Cornelis</creatorcontrib><creatorcontrib>De Graaf Roelof Frederik</creatorcontrib><creatorcontrib>Hoogendam Christiaan Alexander</creatorcontrib><creatorcontrib>Teunissen Franciscus Johannes Herman Maria</creatorcontrib><creatorcontrib>Vogel Herman</creatorcontrib><creatorcontrib>Van Der Meulen Frits</creatorcontrib><creatorcontrib>Mertens Jeroen Johannes Sophia Maria</creatorcontrib><creatorcontrib>Kemper Nicolaas Rudolf</creatorcontrib><creatorcontrib>Donders Sjoerd Nicolaas Lambertus</creatorcontrib><creatorcontrib>Cox Henrikus Herman Marie</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwZYmFhaWRsZORsZEKAEAhE0t7A</recordid><startdate>20161108</startdate><enddate>20161108</enddate><creator>Belfroid Stefan Philip Christiaan</creator><creator>Ten Kate Nicolaas</creator><creator>Verhagen Martinus Cornelis Maria</creator><creator>Smeulers Johannes Petrus Maria</creator><creator>Van Der Toorn Jan-Gerard Cornelis</creator><creator>De Graaf Roelof Frederik</creator><creator>Hoogendam Christiaan Alexander</creator><creator>Teunissen Franciscus Johannes Herman Maria</creator><creator>Vogel Herman</creator><creator>Van Der Meulen Frits</creator><creator>Mertens Jeroen Johannes Sophia Maria</creator><creator>Kemper Nicolaas Rudolf</creator><creator>Donders Sjoerd Nicolaas Lambertus</creator><creator>Cox Henrikus Herman Marie</creator><scope>EVB</scope></search><sort><creationdate>20161108</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>Belfroid Stefan Philip Christiaan ; Ten Kate Nicolaas ; Verhagen Martinus Cornelis Maria ; Smeulers Johannes Petrus Maria ; Van Der Toorn Jan-Gerard Cornelis ; De Graaf Roelof Frederik ; Hoogendam Christiaan Alexander ; Teunissen Franciscus Johannes Herman Maria ; Vogel Herman ; Van Der Meulen Frits ; Mertens Jeroen Johannes Sophia Maria ; Kemper Nicolaas Rudolf ; Donders Sjoerd Nicolaas Lambertus ; Cox Henrikus Herman Marie</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9488923B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Belfroid Stefan Philip Christiaan</creatorcontrib><creatorcontrib>Ten Kate Nicolaas</creatorcontrib><creatorcontrib>Verhagen Martinus Cornelis Maria</creatorcontrib><creatorcontrib>Smeulers Johannes Petrus Maria</creatorcontrib><creatorcontrib>Van Der Toorn Jan-Gerard Cornelis</creatorcontrib><creatorcontrib>De Graaf Roelof Frederik</creatorcontrib><creatorcontrib>Hoogendam Christiaan Alexander</creatorcontrib><creatorcontrib>Teunissen Franciscus Johannes Herman Maria</creatorcontrib><creatorcontrib>Vogel Herman</creatorcontrib><creatorcontrib>Van Der Meulen Frits</creatorcontrib><creatorcontrib>Mertens Jeroen Johannes Sophia Maria</creatorcontrib><creatorcontrib>Kemper Nicolaas Rudolf</creatorcontrib><creatorcontrib>Donders Sjoerd Nicolaas Lambertus</creatorcontrib><creatorcontrib>Cox Henrikus Herman Marie</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Belfroid Stefan Philip Christiaan</au><au>Ten Kate Nicolaas</au><au>Verhagen Martinus Cornelis Maria</au><au>Smeulers Johannes Petrus Maria</au><au>Van Der Toorn Jan-Gerard Cornelis</au><au>De Graaf Roelof Frederik</au><au>Hoogendam Christiaan Alexander</au><au>Teunissen Franciscus Johannes Herman Maria</au><au>Vogel Herman</au><au>Van Der Meulen Frits</au><au>Mertens Jeroen Johannes Sophia Maria</au><au>Kemper Nicolaas Rudolf</au><au>Donders Sjoerd Nicolaas Lambertus</au><au>Cox Henrikus Herman Marie</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2016-11-08</date><risdate>2016</risdate><abstract>A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US9488923B2 |
| source | esp@cenet |
| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T16%3A15%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Belfroid%20Stefan%20Philip%20Christiaan&rft.date=2016-11-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9488923B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |