Cleaning solution, cleaning facility and method of cleaning mount substrate

A method of cleaning a mount substrate comprising the step of: preparing a cleaning solution and cleaning the mount substrate by using the cleaning solution. The cleaning solution is a chemical solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing a keto...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Kinugawa Masaru, Kamo Yoshiyuki
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of cleaning a mount substrate comprising the step of: preparing a cleaning solution and cleaning the mount substrate by using the cleaning solution. The cleaning solution is a chemical solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing a ketone or an aromatic and by adding unsaturated carboxylic acid anhydride or carboxylic anhydride to this solvent.