Method of forming nanowires

According to another embodiment, a semiconductor structure is provided. The structure includes: a substrate; a first nanowire over the substrate; and a second nanowire over the substrate and substantially symmetric with the first nanowire.

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Bibliographische Detailangaben
Hauptverfasser: Li Yung-Ta, Chen Meng-Ku, Huang Yu-Lien
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:According to another embodiment, a semiconductor structure is provided. The structure includes: a substrate; a first nanowire over the substrate; and a second nanowire over the substrate and substantially symmetric with the first nanowire.