Wavefront modification apparatus, lithographic apparatus and method

A wavefront modification apparatus that has a plurality of acoustic emitters, the acoustic emitters configured to emit acoustic waves which travel at least partially across a radiation beam conduit. The acoustic emitters may be configured to establish a standing acoustic wave which extends at least...

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Bibliographische Detailangaben
1. Verfasser:	Sepkhanov Ruslan Akhmedovich
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A wavefront modification apparatus that has a plurality of acoustic emitters, the acoustic emitters configured to emit acoustic waves which travel at least partially across a radiation beam conduit. The acoustic emitters may be configured to establish a standing acoustic wave which extends at least partially across the radiation beam conduit. The wavefront modification apparatus may be provided in a lithographic apparatus, and may be used to modify the wavefront of a radiation beam which is used by the lithographic apparatus to project a pattern onto a substrate.