Projection exposure apparatus with optimized adjustment possibility

Method for operating a projection exposure apparatus for microlithography, the projection exposure apparatus comprising an optical element, a manipulator, which acts on the optical element by changing the temperature of the optical element and the deflection of which brings about a heat flow caused...

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Bibliographische Detailangaben
1. Verfasser:	Bittner Boris
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Method for operating a projection exposure apparatus for microlithography, the projection exposure apparatus comprising an optical element, a manipulator, which acts on the optical element by changing the temperature of the optical element and the deflection of which brings about a heat flow caused by the manipulator into the optical element. The history of the effects, in particular the temperatures introduced into the optical element or the optical effects caused thereby, of the manipulator are recorded in a record.