ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the same

The -ketoimine ligand is represented by the following formula 1: wherein R1 and R2 are each independently a C1-C5 alkyl group. A metal complex compound includes the -ketoimine ligand. A method of forming the -ketoimine ligand and a method of forming a thin film using the metal complex compound inclu...

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Bibliographische Detailangaben
Hauptverfasser:	SAKURAI ATSUSHI, SHIMIZU MASAKO, WADA SENJI, LEE JIN-SEO, SATO HARUYOSHI, CHO YOUN-JOUNG, UEYAMA JUNJI, YOSHINAKA ATSUYA, CHO KYOOUL, CHOI JUNG-SIK, YOSHINO TOMOHARU
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The -ketoimine ligand is represented by the following formula 1: wherein R1 and R2 are each independently a C1-C5 alkyl group. A metal complex compound includes the -ketoimine ligand. A method of forming the -ketoimine ligand and a method of forming a thin film using the metal complex compound including -ketoimine ligand are provided.