Multiple wavelength ellipsometer system and related method

A multiple wavelength ellipsometer system for use in thin film characterization is disclosed. The light source for the system may include sequentially scanned multiple light emitting diodes or laser diodes. The polarization state detector may comprise no moving parts, and utilizes economical uncoate...

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Bibliographische Detailangaben
Hauptverfasser:	JOHS BLAINE D, HADWIGER BRUCE A
Format:	Patent
Sprache:	eng
Schlagworte:	COLORIMETRY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY TESTING
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Beschreibung
Zusammenfassung:	A multiple wavelength ellipsometer system for use in thin film characterization is disclosed. The light source for the system may include sequentially scanned multiple light emitting diodes or laser diodes. The polarization state detector may comprise no moving parts, and utilizes economical uncoated glass plates as beam splitters. The system compensates for potential measurement errors induced by misalignment of the input beam angle to the polarization state detector via a paired arrangement of the beam splitters. To provide improved accuracy in the analysis of data acquired by the system, methods herein actively compensate for the relatively large bandwidth of a preferable light emitting diode source.