Method and apparatus for calibrating sensors that detect wafer protrusion from a wafer cassette

Method and apparatus for calibrating sensors that detect wafer protrusion from a wafer cassette

A calibration gauge, an apparatus and a method for calibrating sensors that detect wafer protrusion from a wafer cassette using the calibration gauge. The calibration gauge includes a disk having a first region which is a circular sector of central angle A1 having a constant radius R1 about a center...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BATES GRAHAM M, BANDY JOHN J, MAHAN BRADLEY M
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
DETECTING MASSES OR OBJECTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GEOPHYSICS
GRAVITATIONAL MEASUREMENTS
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:A calibration gauge, an apparatus and a method for calibrating sensors that detect wafer protrusion from a wafer cassette using the calibration gauge. The calibration gauge includes a disk having a first region which is a circular sector of central angle A1 having a constant radius R1 about a center and an integral second region of increasing radius about the center, the increasing radius increasing from R1 to R2 through a central angle A2, wherein R2 is greater than R1 and A1+A2 equals 360°.