Multilayer structure in an integrated circuit for damage prevention and detection and methods of creating the same

Various embodiments facilitate die protection for an integrated circuit. In one embodiment, a multilayer structure is formed in multiple levels and along the edges of a die to prevent and detect damages to the die. The multilayer structure includes a support layer, a first plurality of dielectric pi...

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Bibliographische Detailangaben
Hauptverfasser: XU YIHENG, RADENS CARL, CLEVENGER LAWRENCE A, KIM BYOUNG YOUP, KLEEMEIER WALTER, ZHANG JOHN H
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Various embodiments facilitate die protection for an integrated circuit. In one embodiment, a multilayer structure is formed in multiple levels and along the edges of a die to prevent and detect damages to the die. The multilayer structure includes a support layer, a first plurality of dielectric pillars overlying the support layer, a metal layer that fills spaces between the first plurality of dielectric pillars, an insulation layer overlying the first plurality of dielectric pillars and the metal layer, a second plurality of dielectric pillars overlying the insulation layer, and a second metal layer that fills spaces between the second plurality of dielectric pillars.