Write pole formed with evaporation deposition

A write pole may be formed by first depositing a dielectric layer onto a substrate and then patterning the dielectric layer to form a trench with a write pole shape. The trench is subsequently filled with the evaporation deposition of a magnetic material to form a write pole. The trench may have a g...

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Bibliographische Detailangaben
Hauptverfasser: BAZAMA ALY A, LUO YONG, INTURI VENKATESWARA R, MUNDENAR JOSEPH M
Format: Patent
Sprache:eng
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Zusammenfassung:A write pole may be formed by first depositing a dielectric layer onto a substrate and then patterning the dielectric layer to form a trench with a write pole shape. The trench is subsequently filled with the evaporation deposition of a magnetic material to form a write pole. The trench may have a greater depth dimension than width dimension.