Aspheric surface measuring method, aspheric surface measuring apparatus, optical element producing apparatus and optical element

The method includes: calculating positional and angular magnification distributions of rays reflected by a reference aspheric surface on a light-receiving sensor and on a sensor conjugate surface; measuring a first wavefront of a reference light on the sensor; and calculating a second wavefront of the reference light on the sensor based on a parameter of an optical system. The method includes: moving at least two movable elements for calibration such that a difference between rotationally symmetric components of the first and second wavefronts becomes small; measuring, after the calibration, a third wavefront of the reference light on the sensor; measuring, after the calibration, a fourth wavefront of the measurement light on the sensor; and calculating the profile of the measurement object aspheric surface by using the third and fourth wavefronts, the positional and angular magnification distributions, and the profile of the reference aspheric surface.