Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER NET ANTONIUS JOHANNUS, JACOBS JOHANNES HENRICUS WILHELMUS, KATE NICOLAAS TEN, REUHMAN-HUISKEN MANA ELISABETH, MOERMAN RICHARD, STAVENGA MARCO KOERT, SCHOONDERMARK BART LEONARD PETER, MENCHTCHIKOV BORIS, MERTENS JEROEN JOHANNES SOPHIA MARIA, OTTENS JOOST JEROEN, DE JONG FREDERIK EDUARD, VERMEER ASCHWIN LODEWIJK HENDRICUS JOHANNES, NIHTIANOV STOYAN, DE MOL CHRISTIANUS GERARDUS MARIA, MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS, QUAEDACKERS JOHANNES ANNA, CADEE THEODORUS PETRUS MARIA, JANSSEN FRANCISCUS JOHANNES JOSEPH, VERHAGEN MARTINUS CORNELIS MARIA, BOOM HERMAN, GOORMAN KOEN, LOOPSTRA ERIK ROELOF, RIEPEN MICHEL, SMEETS MARTIN FRANS PIERRE, TINNEMANS PATRICIUS ALOYSIUS JACOBUS, VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.