Fumaric acid diester based resin for retardation film and retardation film comprising the same

A fumaric acid diester based resin containing a dipropyl fumarate residue unit and a fumaric acid diester residue unit having a C1 or C2 alkyl group, wherein in a retardation film composed of the resin, when a refractive index in the fast axis direction within the film plane is designated as nx, a r...

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Hauptverfasser: TOYOMASU SHINSUKE, MAKITA KENICHI, DOI TOHRU, SHIMOSATO SHINJI
Format: Patent
Sprache:eng
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Zusammenfassung:A fumaric acid diester based resin containing a dipropyl fumarate residue unit and a fumaric acid diester residue unit having a C1 or C2 alkyl group, wherein in a retardation film composed of the resin, when a refractive index in the fast axis direction within the film plane is designated as nx, a refractive index in the film in-plane direction orthogonal thereto is designated as ny, and a refractive index in the thickness direction of the film is designated as nz, the respective refractive indices are satisfied with a relationship of (nx ny