Method for postdoping a semiconductor wafer

A method for treating a semiconductor wafer having a basic doping is disclosed. The method includes determining a doping concentration of the basic doping, and adapting the basic doping of the semiconductor wafer by postdoping. The postdoping includes at least one of the following methods: a proton...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PLOSS REINHARD, SCHULZE HANS-JOACHIM, OEFNER HELMUT
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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