Low-voltage MEMS shutter assemblies

This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is f...

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Bibliographische Detailangaben
Hauptverfasser:	STEYN JASPER L, LEWIS STEPHEN R, PAYNE RICHARD S, VILLARREAL JAVIER, BROSNIHAN TIMOTHY J
Format:	Patent
Sprache:	eng
Schlagworte:	ADVERTISING ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICESUSING STATIC MEANS TO PRESENT VARIABLE INFORMATION CALCULATING COMPUTING COUNTING CRYPTOGRAPHY DISPLAY EDUCATION ELECTRIC DIGITAL DATA PROCESSING MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS SEALS TRANSPORTING
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Beschreibung
Zusammenfassung:	This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.