Composition of matter and molecular resist made therefrom

Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon at...

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Bibliographische Detailangaben
Hauptverfasser: XUE XIANG, JACKSON EDWARD A, FROMMHOLD ANDREAS, LADA THOMAS, ROBINSON ALEX PHILLIP GRAHAM, YANG DONGXU, ROTH JOHN L
Format: Patent
Sprache:eng
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Zusammenfassung:Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.